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Material for Process

Surface Protective Materials E-MASK® Series

Masking/surface protection material developed for leading-edge electronics and optical fields.

Surface Protective Materials E-MASK® R/HR Series

Low contamination type developed for surface protective of electronic and optical parts.

Surface Protective Materials E-MASK® RP Series

Optical grade protective material with an antistatic property produced in a class 1000 clean environment.

Surface Protective Materials E-MASK® RB-S Series

Surface protective materials with an antistatic properties that are ideal for applications that do not tolerate static electricity such as LCD panels.

Back Grinding Tape Line-up ELEP HOLDER

Low adhesion release and UV release. Outstanding characteristics support the backgrind process of wafer manufacturing.

Dicing Tape Line-up ELEP HOLDER

Low adhesion release and UV release. Outstanding characteristics support the dicing process of wafer manufacturing.

Ultrahigh-molecular-weight Polyethylene Porous Film SUNMAP®

Multifunctional porous film for versatile application.

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