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Masking/surface protection material developed for leading-edge electronics and optical fields.
Low contamination type developed for surface protective of electronic and optical parts.
Optical grade protective material with an antistatic property produced in a class 1000 clean environment.
Surface protective materials with an antistatic properties that are ideal for applications that do not tolerate static electricity such as LCD panels.
Low adhesion release and UV release. Outstanding characteristics support the backgrind process of wafer manufacturing.
Low adhesion release and UV release. Outstanding characteristics support the dicing process of wafer manufacturing.
Multifunctional porous film for versatile application.
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