| Type |
UM810 |
UA8400 |
UA3000-II |
Applicable wafer size
(Φ) |
4" |
Ο |
- |
| 5" |
Ο |
- |
| 6" |
Ο |
- |
| 8" |
Ο |
| 12" |
- |
Ο |
Applicable frame
(Φ) |
For 5" |
Ο |
Δ |
- |
| For 6" |
Ο(2 types applicable) |
- |
| For 8" |
Ο |
| For 12" |
- |
Ο |
| Applicable ELEP HOLDER |
UE and DU Series |
| Through-put |
120 wafers/h
(varies depending on irradiation/manual work time) |
100 wafers/h
(varies depending on irradiation time) |
90 wafers/h
(varies depending on irradiation time) |
| Power Supply/Air source |
AC single-phase: 220V 2kW/ordinary use: 0.49MPa or more |
AC three-phase: 200V 4kW/AC single phase: 100V 1.5kW/ordinary use: 0.49MPa or more |
AC three-phase: 6kW/ ordinary use: 0.49MPa or more |
| N2 Source |
ordinary use: 0.29MPa or more |
| Dimension(mm) |
W630×
D620×
H1,000
(line height: 900mm) |
W980× D1,140×
H1,600
(line height: 900mm) |
W980×
D1,920×
H1,750
(complies to SEMI E15.1) |
| Weight |
100kg |
600kg |
|